Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Etching with a hard mask - Plasma Etching - Texas Powerful Smart
Analytics for US Patent No. 6472107, Disposable hard mask for photomask plasma etching
Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation
![PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/56b1bb76acd51804dcf35a31d1cbcb20934471f3/3-Figure1-1.png "PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar")
PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar
PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
Semiconductor Process Materials|Semiconductor material: etc
SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki
Si Hardmask (Si-HM), EUV And Zero Defects
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In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5
Simplified process flow illustrating (a) "via-first" and (b)... | Download Scientific Diagram
The micropatterns (first figure) can be achieved by | Chegg.com
NIL_vs_NEP-768x604.png
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
